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High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) 1. udgave
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High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) 1. udgave
This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS).
246 pages, 18 Tables, black and white; 24 Illustrations, color; 79 Illustrations, black and white
| Medie | Bøger Hardcover bog (Bog med hård ryg og stift omslag) |
| Udgivet | 18. december 2020 |
| ISBN13 | 9781771888431 |
| Forlag | Apple Academic Press Inc. |
| Antal sider | 264 |
| Mål | 650 g |
| Sprog | Engelsk |
| Klipper/redaktør | Baishya, Srimanta (National Institute of Technology, India) |
| Klipper/redaktør | Maity, Reshmi (Mizoram University, India) |
| Klipper/redaktør | Pratap Maity, Niladri (Mizoram University, India) |